SePArate: Segmenting Patterns from Defects in Wafer Manufacturing Using Weak Supervision

📅 2026-08-31
📈 Citations: 0
Influential: 0
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🤖 AI Summary
为解决半导体制造中缺陷分析自动化不足的问题,提出了一种基于弱监督的晶圆缺陷分割方法SePArate,通过三阶段训练实现精确分割。
📝 Abstract
In semiconductor manufacturing, defect analysis is essential, but manual inspection cannot scale. However, existing automated inspection methods remain insufficient for root-cause analysis and process optimization. To this end, we present SePArate, a weakly supervised wafer defect segmentation method. SePArate enables pixel-level separation of patterns by leveraging only image-level annotations. It consists of a three-phase training: encoder pretraining, knowledge transfer to learn spatial cues, and training on synthetic mixed-defect data for accurate segmentation. Experiments demonstrate that SePArate outperforms the baselines.
Problem

Research questions and friction points this paper is trying to address.

defect analysis
semiconductor manufacturing
automated inspection
root-cause analysis
process optimization
Innovation

Methods, ideas, or system contributions that make the work stand out.

weak supervision
wafer defect segmentation
three-phase training
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